SUBSTITUTES
Alternative producers in overlapping segments/subsegments — ranked by lower chokepoint score. Sanctioned peers sink to the bottom.
Plasma-Therm
Keys: equipment front end · equipment front end/etch
- Oxford InstrumentsUnited KingdomOverlap: equipment front end/etch
- PSK IncSouth KoreaOverlap: equipment front end/etch
- Hitachi High-TechJapanOverlap: equipment front end/etch
- SEMESSouth KoreaOverlap: equipment front end/etch
- Applied MaterialsUnited StatesOverlap: equipment front end/etch
- Lam ResearchUnited StatesOverlap: equipment front end/etch
- Tokyo ElectronJapanOverlap: equipment front end/etch
- Overlap: equipment front end/etch
- ●NAURA TechnologyChinaOverlap: equipment front end/etch
- Hana Materials Inc.South KoreaOverlap: equipment front end
- Veeco InstrumentsUnited StatesOverlap: equipment front end
- BrukerUnited StatesOverlap: equipment front end
| Candidate | Country | Score | Verdict | Overlap | |
|---|---|---|---|---|---|
| Oxford Instruments | United Kingdom | 31 | CLEAR | equipment front end/etch | Compare › |
| PSK Inc | South Korea | 31 | CLEAR | equipment front end/etch | Compare › |
| Hitachi High-Tech | Japan | 34 | CLEAR | equipment front end/etch | Compare › |
| SEMES | South Korea | 34 | CLEAR | equipment front end/etch | Compare › |
| Applied Materials | United States | 37 | CLEAR | equipment front end/etch | Compare › |
| Lam Research | United States | 37 | CLEAR | equipment front end/etch | Compare › |
| Tokyo Electron | Japan | 37 | CLEAR | equipment front end/etch | Compare › |
| ●AMEC (Advanced Micro-Fabrication) | China | 81 | CRITICAL | equipment front end/etch | Compare › |
| ●NAURA Technology | China | 82 | CRITICAL | equipment front end/etch | Compare › |
| Hana Materials Inc. | South Korea | 13 | CLEAR | equipment front end | Compare › |
| Veeco Instruments | United States | 26 | CLEAR | equipment front end | Compare › |
| Bruker | United States | 26 | CLEAR | equipment front end | Compare › |