CHOKEPOINT
MIXEDGraph 2026-08-10---- -- -- --:--:-- UTC
ENTITY · oxford_instruments

Oxford InstrumentsOXIG

United Kingdom·etch·niche·$0.0B mkt cap

Plasma etch and deposition tools for compound semis and research.

CLEAR · 0–39
31/100 illustrative
Underwriting Thesis

CLEAR — Oxford Instruments: criticality to DoD-exposed downstream programs compounded by sole-source / single-point-of-failure dominance in etch. A chokepoint underwriting concern at this tier.

Factor Breakdown
Foreign-Origin Concentration18
Sole-Source Dependence54
Sanctions Exposure0
Downstream Criticality60
Sanctions Exposure

Entity not present on tracked screening lists (CSL).

DoD Exposure

No matched DoD semiconductor awards (USASpending) for this entity.

Segments
etchdeposition
Shortest paths → DoD-exposed firms
  • GlobalFoundries · 1 hop · $1.05B
    Oxford Instruments → GlobalFoundries
  • Marvell Technology · 2 hops · $184.3M
    Oxford Instruments → TSMC → Marvell Technology
  • Valens Semiconductor · 2 hops · $28.3M
    Oxford Instruments → TSMC → Valens Semiconductor
  • Scale AI · 3 hops · $105.6M
    Oxford Instruments → TSMC → NVIDIA → Scale AI
Chokepoint Relationships

Key Suppliers · upstream · 0

No mapped upstream suppliers.

Key Customers · downstream · 7

Data Provenance· generated 2026-08-10 01:06:49Z
  • Consolidated Screening List (CSL) [LIVE] https://data.trade.gov/downloadable_consolidated_screening_list/v1/consolidated.json @ 2026-08-10T01:06:49.039Z
  • USASpending.gov — DoD award search [LIVE] https://api.usaspending.gov/api/v2/search/spending_by_award/ @ 2026-08-10T01:06:49.377Z
  • Curated ownership aggregation [FALLBACK] @ 2026-08-10T01:06:49.378Z
  • Curated China-ecosystem + Nexperia edges (Phase B, CSET ETO + TechInsights + TrendForce + SCMP + BIS Entity List + Nexperia press release) [FALLBACK] @ 2026-08-10T01:06:49.378Z

Firm/commodity-level signals from public data — not component-level BOM. Scores are an analytic underwriting heuristic, not legal or procurement advice.