SUBSTITUTES
Alternative producers in overlapping segments/subsegments — ranked by lower chokepoint score. Sanctioned peers sink to the bottom.
TRUMPF
Keys: equipment front end · equipment front end/lithography
- NikonJapanOverlap: equipment front end/lithography
- CanonJapanOverlap: equipment front end/lithography
- UshioJapanOverlap: equipment front end/lithography
- ASMLNetherlandsOverlap: equipment front end/lithography
- Carl Zeiss SMTGermanyOverlap: equipment front end/lithography
- Overlap: equipment front end/lithography
- Hana Materials Inc.South KoreaOverlap: equipment front end
- Veeco InstrumentsUnited StatesOverlap: equipment front end
- BrukerUnited StatesOverlap: equipment front end
- ClassOne TechnologyUnited StatesOverlap: equipment front end
- ACM ResearchUnited StatesOverlap: equipment front end
- Ultra Clean HoldingsUnited StatesOverlap: equipment front end
| Candidate | Country | Score | Verdict | Overlap | |
|---|---|---|---|---|---|
| Nikon | Japan | 31 | CLEAR | equipment front end/lithography | Compare › |
| Canon | Japan | 32 | CLEAR | equipment front end/lithography | Compare › |
| Ushio | Japan | 34 | CLEAR | equipment front end/lithography | Compare › |
| ASML | Netherlands | 41 | WATCH | equipment front end/lithography | Compare › |
| Carl Zeiss SMT | Germany | 41 | WATCH | equipment front end/lithography | Compare › |
| ●Shanghai Micro Electronics (SMEE) | China | 82 | CRITICAL | equipment front end/lithography | Compare › |
| Hana Materials Inc. | South Korea | 13 | CLEAR | equipment front end | Compare › |
| Veeco Instruments | United States | 26 | CLEAR | equipment front end | Compare › |
| Bruker | United States | 26 | CLEAR | equipment front end | Compare › |
| ClassOne Technology | United States | 26 | CLEAR | equipment front end | Compare › |
| ACM Research | United States | 27 | CLEAR | equipment front end | Compare › |
| Ultra Clean Holdings | United States | 27 | CLEAR | equipment front end | Compare › |