SUBSTITUTES
Alternative producers in overlapping segments/subsegments — ranked by lower chokepoint score. Sanctioned peers sink to the bottom.
Nikon
Keys: equipment front end · equipment front end/lithography
| Candidate | Country | Score | Verdict | Overlap | |
|---|---|---|---|---|---|
| Canon | Japan | 32 | CLEAR | equipment front end/lithography | Compare › |
| Ushio | Japan | 34 | CLEAR | equipment front end/lithography | Compare › |
| ASML | Netherlands | 41 | WATCH | equipment front end/lithography | Compare › |
| Carl Zeiss SMT | Germany | 41 | WATCH | equipment front end/lithography | Compare › |
| TRUMPF | Germany | 41 | WATCH | equipment front end/lithography | Compare › |
| ●Shanghai Micro Electronics (SMEE) | China | 82 | CRITICAL | equipment front end/lithography | Compare › |
| Hana Materials Inc. | South Korea | 13 | CLEAR | equipment front end | Compare › |
| Veeco Instruments | United States | 26 | CLEAR | equipment front end | Compare › |
| Bruker | United States | 26 | CLEAR | equipment front end | Compare › |
| ClassOne Technology | United States | 26 | CLEAR | equipment front end | Compare › |
| ACM Research | United States | 27 | CLEAR | equipment front end | Compare › |
| Ultra Clean Holdings | United States | 27 | CLEAR | equipment front end | Compare › |