SUBSTITUTES
Alternative producers in overlapping segments/subsegments — ranked by lower chokepoint score. Sanctioned peers sink to the bottom.
DuPont
Keys: materials · materials/photoresists chemicals · materials/cmp slurries
- Brewer ScienceUnited StatesOverlap: materials/photoresists chemicals
- AtomeraUnited StatesOverlap: materials/photoresists chemicals
- AvantorUnited StatesOverlap: materials/photoresists chemicals
- Element SolutionsUnited StatesOverlap: materials/photoresists chemicals
- Kanto Denka KogyoJapanOverlap: materials/photoresists chemicals
- FoosungSouth KoreaOverlap: materials/photoresists chemicals
- SK EnpulseSouth KoreaOverlap: materials/cmp slurries
- DNFSouth KoreaOverlap: materials/photoresists chemicals
- UP ChemicalSouth KoreaOverlap: materials/photoresists chemicals
- AdekaJapanOverlap: materials/photoresists chemicals
- EntegrisUnited StatesOverlap: materials/photoresists chemicals, materials/cmp slurries
- Nagase & Co.JapanOverlap: materials/photoresists chemicals
| Candidate | Country | Score | Verdict | Overlap | |
|---|---|---|---|---|---|
| Brewer Science | United States | 26 | CLEAR | materials/photoresists chemicals | Compare › |
| Atomera | United States | 28 | CLEAR | materials/photoresists chemicals | Compare › |
| Avantor | United States | 30 | CLEAR | materials/photoresists chemicals | Compare › |
| Element Solutions | United States | 30 | CLEAR | materials/photoresists chemicals | Compare › |
| Kanto Denka Kogyo | Japan | 31 | CLEAR | materials/photoresists chemicals | Compare › |
| Foosung | South Korea | 31 | CLEAR | materials/photoresists chemicals | Compare › |
| SK Enpulse | South Korea | 31 | CLEAR | materials/cmp slurries | Compare › |
| DNF | South Korea | 31 | CLEAR | materials/photoresists chemicals | Compare › |
| UP Chemical | South Korea | 31 | CLEAR | materials/photoresists chemicals | Compare › |
| Adeka | Japan | 31 | CLEAR | materials/photoresists chemicals | Compare › |
| Entegris | United States | 32 | CLEAR | materials/photoresists chemicals, materials/cmp slurries | Compare › |
| Nagase & Co. | Japan | 32 | CLEAR | materials/photoresists chemicals | Compare › |