SUBSTITUTES
Alternative producers in overlapping segments/subsegments — ranked by lower chokepoint score. Sanctioned peers sink to the bottom.
SK Enpulse
Keys: materials · materials/photomasks · materials/cmp slurries
- Overlap: materials/photomasks
- DuPontUnited StatesOverlap: materials/cmp slurries
- EntegrisUnited StatesOverlap: materials/cmp slurries
- PhotronicsUnited StatesOverlap: materials/photomasks
- FUJIFILMJapanOverlap: materials/cmp slurries
- TOPPAN HoldingsJapanOverlap: materials/photomasks
- Dai Nippon PrintingJapanOverlap: materials/photomasks
- ResonacJapanOverlap: materials/cmp slurries
- SoulbrainSouth KoreaOverlap: materials/cmp slurries
- AGC Inc.JapanOverlap: materials/photomasks
- TokuyamaJapanOverlap: materials/cmp slurries
- HOYAJapanOverlap: materials/photomasks
| Candidate | Country | Score | Verdict | Overlap | |
|---|---|---|---|---|---|
| Mitsui Chemicals, Inc. | Japan | 16 | CLEAR | materials/photomasks | Compare › |
| DuPont | United States | 30 | CLEAR | materials/cmp slurries | Compare › |
| Entegris | United States | 32 | CLEAR | materials/cmp slurries | Compare › |
| Photronics | United States | 33 | CLEAR | materials/photomasks | Compare › |
| FUJIFILM | Japan | 34 | CLEAR | materials/cmp slurries | Compare › |
| TOPPAN Holdings | Japan | 34 | CLEAR | materials/photomasks | Compare › |
| Dai Nippon Printing | Japan | 34 | CLEAR | materials/photomasks | Compare › |
| Resonac | Japan | 34 | CLEAR | materials/cmp slurries | Compare › |
| Soulbrain | South Korea | 34 | CLEAR | materials/cmp slurries | Compare › |
| AGC Inc. | Japan | 34 | CLEAR | materials/photomasks | Compare › |
| Tokuyama | Japan | 35 | CLEAR | materials/cmp slurries | Compare › |
| HOYA | Japan | 37 | CLEAR | materials/photomasks | Compare › |