SUBSTITUTES
Alternative producers in overlapping segments/subsegments — ranked by lower chokepoint score. Sanctioned peers sink to the bottom.
HOYA
Keys: materials · materials/photomasks
- Overlap: materials/photomasks
- SK EnpulseSouth KoreaOverlap: materials/photomasks
- PhotronicsUnited StatesOverlap: materials/photomasks
- TOPPAN HoldingsJapanOverlap: materials/photomasks
- Dai Nippon PrintingJapanOverlap: materials/photomasks
- AGC Inc.JapanOverlap: materials/photomasks
- Taiwan Mask CorporationTaiwanOverlap: materials/photomasks
- SemiQ Inc.United StatesOverlap: materials
- Absolics Inc.United StatesOverlap: materials
- Brewer ScienceUnited StatesOverlap: materials
- AtomeraUnited StatesOverlap: materials
- DuPontUnited StatesOverlap: materials
| Candidate | Country | Score | Verdict | Overlap | |
|---|---|---|---|---|---|
| Mitsui Chemicals, Inc. | Japan | 16 | CLEAR | materials/photomasks | Compare › |
| SK Enpulse | South Korea | 31 | CLEAR | materials/photomasks | Compare › |
| Photronics | United States | 33 | CLEAR | materials/photomasks | Compare › |
| TOPPAN Holdings | Japan | 34 | CLEAR | materials/photomasks | Compare › |
| Dai Nippon Printing | Japan | 34 | CLEAR | materials/photomasks | Compare › |
| AGC Inc. | Japan | 34 | CLEAR | materials/photomasks | Compare › |
| Taiwan Mask Corporation | Taiwan | 48 | WATCH | materials/photomasks | Compare › |
| SemiQ Inc. | United States | 5 | CLEAR | materials | Compare › |
| Absolics Inc. | United States | 5 | CLEAR | materials | Compare › |
| Brewer Science | United States | 26 | CLEAR | materials | Compare › |
| Atomera | United States | 28 | CLEAR | materials | Compare › |
| DuPont | United States | 30 | CLEAR | materials | Compare › |